For the chemical industry we provide custom designed filter cassetes with an assortment of high quality filter material. For monomer recycle units in gas phase filtering systems our products have proven to be reliable and protective for the compressor units.

For the semiconductor industry we have a variety of high efficient traps. Our Multipass Turbo Traps MTT are the best in the market and can be used for demanding TEOS, NITRIDE, POLY, LTO, HTO and plasma applications. The filter protects oil sealed vacuum pumps and dry vacuum systems. It also removes corrosive and abrasive particles that can destroy your vacuum pumps. The design of the MTT is unique, it's modular structure allowseasy replacement access ability. There are three stages intrapping the fluent. In the first stage the volatile solids and liquids are condensed on a large surface area. The second trap knocks down more then 90% of the corrosive chemicals and fine particles. Finally in the third step the remaining impurities are filtered out.

Dimensions:      Outside diameter:                       150    mm

                      Inside diameter topside:               90      mm

                      Inside diameter bottomside:          90      mm

                      Total lenght:                              300    mm

                      Medium surface bruto:                  1.3160  m²

   Medium surface netto:                  1.2580  m²

Materials:

Filtermedium:                          

200*1400 mesh RVS304 gitter on 30 mesh

RVS304 support gitter

Weight:   750       g/m²

Thickness:       0.14      mm

Selectivity (nominal): 5 μm

Selectivity (nominal):  11-13 μm

Lid:                    RVS304

Supportpipe:        #5 geperforeerd RVS304

Bonding:              Mono-component epoxyhars

Maximal operating temperature:                         190°C

Bellows in silicone:

   Bellows in SS 316 L in silicone:

   DN 63 ISO-K x 120 mm length.

   DN 100 ISO-K x 120 mm length.

Watercooled Trap:

   Watercooled Trap for semiconductor applications (LPCVD-Nitride), used direct on the furnace and/on the exhaust side of the dry pump. Meantime between maintenance up to 300.000 Angstrom deposition.

   Connections DN 40 KF, DN 50 KF, DN 63 ISO-K, DN 80 KF and DN 100 ISO-K.

Particle Trap:

   Particle Trap for semiconductor applications (LPCVD-TEOS), used direct on the furnace.

   Meantime between maintenance up to 150.000 Angstrom deposition.

  Connections DN 63 ISO-K, DN 80 KF and DN 100 ISO-K.