Flokal Jipelec

   Innovative liquid precursor delivery nod vaporization system for MOCVD.

   The Jipelec Inject system has been specially developed for low vapor pressure precursors.

   It allows pure liquid precursors, liquid and solid precursors dissolved in earner liquid (organic solvent) to be used tor CVD and MOCVD processes.

   The Jipelec Inject provides repeatable performance characteristics which are primarily based on a contactless flash evaporation of the precursor materials. The source container remains at room temperature and prevents decomposition of thermally unstable precursors.

   The carrier gas is injected independently into the evaporator. The system enables a number of precursors to be used, gives accurate control of the growth parameters and the possibility of multilayer deposition of different materials during a single cycle for large-scale applications. The system is designed to operate both under vacuum or at atmospheric pressure.

Applications:

Microelectronics: SiO₂, Ta₂,  O5, Cu, TiN, TaN, NbN...

High k Dielectric: SrTiO₃ BaTiO₃ BST. Ta₂O5, ZrO₂, HfO₂

Ferroelectric: SBT. SBTN, PLZT, and PZT

Piezoelectric: (Pb, Sr) (ZrTi)O₃, MPT (Modified Lead Titanate)

Superconductor: YBCO, Bi-2223. Bi-2212. Tl-1223...

CMR Colossal Magneto Resistance : BaFe₁₂O₁₉, La_1-xMnO_3-y. ...

Thermal coating: ZrO₂, YSZ...

Buffer layers: CeO₂;, SrTiO₃.;...

Mechanical coating: ZrN, TiN, ShN₄...

Optics: oxides and anti reflecting layers, super mirrors (Ta₂O₅/SiO₂)n

Electroluminescent devices: ZnS: Mn, ZnS:Tb, SrS:Ce...

Display devices, optical fibers, etc.

Features:

Up to 4 injectors on the same evaporator.

Digital control interface (RS232, RS485, Devicenet).

Split furnace.

Easy cleaning.

Performance:

Liquid Control Range: 120 mg hr to 30g/hr.

Temperature range: 50 to 300°C.

Mixing Chambers/Evaporators  (Liquid Delivery System with Vapour Control)

The CEM-System (Controlled Evaporation and Mixing) is an innovative Liquid Delivery System (LDS) that can be applied for atmospheric or vacuum processes. It consists of a liquid flow controller, an MFC for carrier gas and a temperature controlled mixing and evaporation device. The system is suitable for mixing liquid flows of 0,25-1000 g/h resulting in saturated vapour flows of 5 sccm to 20 slm. This CEM-system can replace bubblers. New opportunities created with the CEM-system: mixtures can be evaporated and even solids, dissolved in solvents can be vaporised successfully.The process is fast, accurate, highly repeatable and efficient.

APPLICATIONS

CVD (Chemical Vapour Deposition), e.g. for hardening or planarization processes

Testing/calibration of analyzers with reference gas vapour concentrations

Toxic gas effects on protective clothing

Analyzers with reference H₂O vapour concentrations

Humidification of fuels anaesthetics

FEATURES

Accurately controlled gas/liquid mixture

Fast response

High reproducibility and accuracy

Very stable vapour flow

Flexible selection of gas/liquid ratio

Lower working temperature than conventional system